Japanese kws tshawb fawb Omori thiab lwm tus tau tshawb fawb superabrasive sib tsoo log txij li xyoo 1987, tau tsim txoj kev sib tsoo uas siv electrolytic In Process Dressing (ELID), thiab pom tau tias qib high-qib iav sib tsoo thiab ductile sib tsoo ntawm cov ntaub ntawv nyuaj thiab nkig. , thiab tam sim no txoj kev tau ua tiav rau kev ua haujlwm ntawm ultra-precision machining ntawm kheej kheej, aspherical lo ntsiab muag thiab pwm.
① ELID daim iav sib tsoo txoj cai
ELID kev sib tsoo muaj xws li: hlau daim ntawv cog lus ultra-fine grained super-hard abrasive sib tsoo log, electrolytic hnav lub hwj chim qhov chaw, electrolytic hnav khaub ncaws electrode, electrolyte (tseem siv ua kua sib tsoo), hluav taws xob txhuam thiab cov cuab yeej siv tshuab. Nyob rau hauv cov txheej txheem sib tsoo, lub log sib tsoo txuas nrog tus ncej zoo ntawm cov khoom siv hluav taws xob los ntawm kev txhuam hluav taws xob, cov khoom siv hluav taws xob tau nruab rau ntawm lub tshuab cuab yeej txuas nrog tus ncej tsis zoo ntawm cov khoom siv hluav taws xob, thiab cov electrolyte yog nchuav ntawm kev sib tsoo. lub log thiab cov electrode, yog li ntawd lub hwj chim mov, sib tsoo log, electrode, sib tsoo log thiab cov electrolyte ntawm electrodes los tsim ib tug tiav electrochemical system.
Thaum siv ELID sib tsoo, muaj qee qhov tshwj xeeb uas yuav tsum tau ua rau lub log sib tsoo, lub zog siv hluav taws xob thiab siv electrolyte.
Tus neeg sawv cev sib tsoo ntawm lub log sib tsoo yuav tsum muaj cov khoom siv hluav taws xob zoo thiab electrolysis, thiab hydroxide lossis oxide ntawm cov khoom sib txuas ntawm cov khoom sib txuas yog cov tsis muaj hluav taws xob thiab insoluble hauv dej. Lub zog siv hluav taws xob siv rau ELID sib tsoo tuaj yeem siv DC lub zog hluav taws xob ntawm electrolytic machining lossis ntau yam Waveform pulse fais fab mov lossis DC lub hauv paus mem tes fais fab mov. Hauv cov txheej txheem sib tsoo ELID, cov electrolyte tsis tsuas yog ua cov kua dej sib tsoo, tab sis kuj tseem ua lub luag haujlwm hauv kev txo qhov kub ntawm qhov sib tsoo thiab txo kev sib txhuam. ELID kev sib tsoo feem ntau yog siv cov dej-soluble sib tsoo kua, uas yog ib lub tshuab uas siv lub tshuab sib tsoo log. Lub zog yog siab, thiab kev sib tsoo log hnav me me los ntawm kev teeb tsa qhov tsim nyog ntawm electrolysis. Nyob rau tib lub sijhawm, cov duab zoo tuaj yeem tau txais. Ua raws li txoj cai no, ultra-precision daim iav sib tsoo ntawm cov khoom siv kho qhov muag ntawm ntau cov duab los ntawm lub tiaj mus rau aspherical qhov chaw tuaj yeem pom tau.
②ELID daim iav sib tsoo txoj kev sim
Ntawm ASG-2500T tshuab cuab yeej ntawm Rank Pneumo Company, Omori ELID system tsim los ntawm kev sib tsoo lub log, lub zog siv hluav taws xob, cov khoom siv hluav taws xob, cov dej sib tsoo, thiab lwm yam. yog ntsia rau siv 400 # rau kev sib sau ntxhib thiab 1000 # lossis 2000 # rau semi-tiav. Thaum daim iav sib tsoo, siv 4000 # (qhov nruab nrab qhov loj me yog li 4μm) lossis 8000 # (qhov nruab nrab qhov loj yog li 2μm) cam khwb cia hlau daim ntawv cog lus pob zeb diamond sib tsoo log, electrolytic sharpening fais fab mov (ELID fais fab mov), siv DC siab zaus mem tes voltage hom tshwj xeeb fais fab mov, qhov ua hauj lwm voltage yog 60V, tam sim no yog lOA. Thaum siv cov kua sib tsoo, nws yuav tsum tau dilute cov dej-soluble sib tsoo kua AFH-M thiab CEM los ntawm 50 zaug nrog dej ntshiab.
③ ELID daim iav sib tsoo txoj kev sim thiab kev sim ua tiav
Rau aspherical nto machining, lub tiaj sib tsoo log tsuas yog tsim thiab sib xyaw ua ke los ntawm lub tais-zoo li tus sib tsoo log (325 # cam khwb cia hlau daim ntawv cog lus pob zeb diamond sib tsoo log yog φ30 × W2mm) ntsia ntawm lub workpiece ncej. Rough sib tsoo thiab 1000 # semi-tiav, thiab thaum kawg siv 4000 # rau ELID daim iav sib tsoo. Ntawm lub tshuab ua haujlwm ultra-precision aspheric, nrog kev pab los ntawm ELID kev sib tsoo tshuab, cov iav kho qhov muag BK-7 aspheric lens tau ua tiav. . Qhov tseeb saum npoo zoo dua o. 2μm, qhov nto roughness ncav cuag Ra20nm, thiab rau cov aspheric nto ua cov ntaub ntawv me ntsis xws li LASFN30 thiab Ge, qhov tseeb nto kuj yuav zoo dua O. 2-O. 3μm, nto roughness mus txog Ra30nm.